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Journal of Applied Physics : Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots

By D. Smeets, J. Demeulemeester, D. Deduytsche, C. Detavernier, C. M. Comrie et al

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Book Id: WPLBN0002169378
Format Type: PDF eBook :
File Size: Serial Publication
Reproduction Date: 25 November 2008

Title: Journal of Applied Physics : Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots  
Author: D. Smeets, J. Demeulemeester, D. Deduytsche, C. Detavernier, C. M. Comrie et al
Volume: Issue : November 2008
Language: English
Subject: Science, Physics, Natural Science
Collections: Periodicals: Journal and Magazine Collection, Journal of Applied Physics Collection
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Publisher: American Institute of Physics

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J. Demeulemeester, D. Deduytsche, C. Detavernier, C. M. Comrie Et A, D. S. (n.d.). Journal of Applied Physics : Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots. Retrieved from http://nationalpubliclibrary.info/


Description
Description: When the Kissinger method is used to investigate thin film growth kinetics, activation energies obtained are often significantly higher than those of Arrhenius plots based on isothermal studies. The reason for the higher activation energies is related to the sensitivity of the Kissinger analysis to nucleation effects. In fact, this often undesirable effect opens the possibility of studying nucleation barriers in a semiquantitative way. Furthermore, we show that these nucleation effects can be filtered out by a more careful application of the Kissinger method, and activation energies that are consistent with Arrhenius plots are then obtained.

 

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